KSA SpectR Spectral Reflectance Measurement EquipmentIt is a non-contact measuring device used to measure the absolute reflectance, L * a * b * color value, and growth rate of spectra. This tool has various application functions for online monitoring and process control, including vertical cavity surface emitting lasers (VCSEL), distributed Bragg reflectors (DBR), and other complex device structures. This device is mainly used for monitoring and measuring thin film production research such as sputtering, MBE, and MOCVD.
kSA SpectRThe optical mirror group is configured with a geometric shape of specular reflection. The measurement technology used by k-space originated from Sandia National Laboratory in the United States and has been authorized for use by the laboratory. In this measurement principle, the program automatically fits every new layer grown on the film, treating all existing substrates and film layers as a new virtual substrate. KSA SpectR can measure at multiple wavelengths simultaneously, each with potential unique advantages. This tool can easily measure custom spectral features such as minimum, maximum, inflection point, or baseline scattering level of reflectance within any wavelength range selected by the customer.
Measurement examples
Spectral reflectance of 850 nm DBR
Reflectance and fitting curves at 532 and 940 nm when growing 250 nm AlAs and 500 nm GaAs on GaAs substrate
Real time fitting curves of growth rate, optical constants, and reflectivity during the growth period of AlAs
Uncorrected pyrometer measurement results and calibrated ECP temperature for AlAs and GaAs growth
Single reflectivity oscillation period diagram during GaAs thin film growth process