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Enkoyou N&Q series lithography machine 4008 from the United States
Enkoyou N&Q series lithography machine 4008 from the United States
Product details

Brand: Enke You(N&Q

model:NXQ400-8

Origin: United States

Enkoyou lithography machines are divided into two series: semi-automatic and fully automatic. Among them,N&Q4000The series of lithography machines are mainly based on semi-automatic systems. The superior operability, ultra-high resolution, uniform optical system, modern advanced proximity and contact lithography, and ultra-high cost-effectiveness of this system make Enko Youlithography systemIt has been adopted by many famous enterprises, research centers, institutes, and universities across the country, and has become their preferred lithography system;

2、 Technical parameters:

1Chip size:5mm~200mmThe circular disc/Square and irregular fragments (supporting special chuck design for irregular fragments);

2Exposure wavelength:350nm-450nm(Other wavelengths are optional);

3Mercury lamp power:350W/500W(Other power options available);

4Resolution: superior to0.5um

5Exposure mode: Supports proximity exposure, various contact types (vacuum contact, soft contact, hard contact, etc.) exposure;

6Range of emitted light intensity:10mW/cm2~55mW/ cm2@405nm

7Support constant light intensity or constant power mode;

8Exposure time:0.1~999.9s

9Alignment accuracy: Dual HD colorCCD +Dual high-definition color monitor with alignment accuracy of up to0.4Within micrometers;

10Mask size:2 x 2Inches to9 x 9inch(2 x 2Inches require a mask converter)

11Uniformity of light intensityUniformity

<±1% over 2 Region;

<±2% over 4 Region;

<±3% over 6 Region;

12Double sided lithography: equipped with backside infrared alignment(IR BSA)Align with the optical backside(OBS BSA)Double sided alignment accuracy ≤2μm

13Power supply: High sensitivity light intensity controllable power supply.

Optional models:

NXQ400-6

NXQ400-8

NXQ800-6

NXQ8006 Sapphire

NXQ800-8

3、 Product features:

Optional support for single-sided alignment and double-sided alignment design;

High definition color dualCCDThe lens adopts the most advanced split field microscope lens (based on infinite correction)CCDLens design); Dual head high-definition full-color objective lens (single field of view or split field of view can be flexibly selected by users);

High definition color dual display screen;

New pneumatic bearing guide railDesigned with high precision, low wear and tear, and no need for after-sales maintenance;

haveAutomatic executionWedge error compensation, and after levelingAutomatic positioningFunction;

Easy to operate, withSupport multiple operators to use on the same platformA user-friendly interface;

The control mode of the joystickUnique design;

useLEDPenetrating objective illumination technology, with super strong alignment brightness;

Adopting based onMicroscope lens with infinite distance correctionframework;

Anti diffraction reflectionEfficient optical path design;

Equipped with safety protection functionTemperature and airflow sensors;

Panoramic collimating lens with half angle deviation of light rays: < one point eight fourDegree;

Equipment stability and high durability;

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Successful operation!

Successful operation!

Successful operation!