HP Spectroscopy, a German company founded in 2012, is committed to customizing the best solutions for customers in the global scientific and industrial fields. It is a global supplier and leading developer of scientific instruments. The product line includes XAS systems, XUV/VUV/X-ray spectrometers, beamline products, and more. The main team is composed of experts in X-ray, spectroscopy, grating design, plasma physics, beamline and other fields. And maintain close cooperation with scientists from leading research institutions around the world, pay attention to cutting-edge technologies, and maintain product iteration and innovation.
Product Introduction
Flat field and vertical incidence spectrometer
Exclusive slit free design to ensure maximum efficiency
Wavelength range 30~250 nm
The most compact spectrometer in the same category
Modular and complete design
EasyLIGHT XUV provides broadband spectral measurements with unprecedented efficiency. The slit free design directly images the radiation source, eliminating the cumbersome entrance slit. The spectral range of 30 to 250nm conveniently covers many applications in HHG and plasma diagnostics. Compared to grazing incidence spectrometers, the vertical incidence design of easyLight XUV provides simple installation and alignment. Modular design matches various experimental geometries and configurations. EasyLIGHT has an integrated slit holder and closed-loop electric grating positioning function.
Detector optional types:
VUV CCD camera has the highest resolution and dynamic range
MCP and CMOS detectors have the widest wavelength coverage range, gate control, and enhanced detector capabilities
Customized design based on easyLight spectrometer can be discussed
No slit design
HPS's proprietary spectrometer design can be used for direct source imaging. Therefore, there is no need for narrow entrance slits and the incident light can be collected to the maximum extent possible. Compared to traditional spectrometer architectures, the light intensity reaching the detector will be 20 times higher. This structure also greatly improves the stability of daily operations.
Technical parameters:
application
High-order harmonic light source
Aces Science
Interaction between intense laser and matter
Laser and discharge generate plasma sources
Characterization of synchrotron radiation beam
Free electron laser